公告搜索
Molecular-Transfer Lithography(分子传质光学刻版)
项目编号: 状态:已结束 联系方式:
发布时间:2013/5/6来源:本站 我要咨询 T:
分享:

项目名称:Molecular-Transfer Lithography(分子传质光学刻版)

编号:01-053
类别: Semiconductor/Processing

项目描述:
This invention introduces a new low-cost contact-based lithography method that provides high resolution capability and addresses the particulate contamination issues in the lithography that affect the subsequent processing steps such as etching process.
The lithography is performed by adding an intermediate buffer process and tool to the conventional infrastructure of mask making and exposure technology. The process initiates by forming a latent image of a photo-resist layer on a separate planner carrier. This carrier is then aligned to the substrate and the photo-imaged layer is physically transferred through contact of this carrier with the substrate and adhesion of the photo-imaged layer to this substrate. The carrier is removed after adhesion of the resist to the substrate.
This approach involves the contact of two smooth surfaces and doesn't require high pressure contact forces to achieve high resolution lithography. The contact of the imaged layer to the substrate occurs away from the upper surface. Thus, the presence of any possible embedded particles should not affect the subsequent processes such as etching process. One of the advantages of this invention is the fact that only a blank planner carrier is exposed using the stepper. Therefore, the stepper can be highly utilized and depth-of-focus and flatness issues are eliminated. This lithography method provides high resolution without a need for the anti-reflective coating on the substrate.
MxL technology can improve the throughput of stepper technology by a factor of 3-6 while significantly cutting the cost of the optical imaging tool. MxL technology works in conjunction with existing patterning/exposure tools to lower manufacturing and capital costs, while removing or reducing critical technical problems associated with imaging tools such as depth of focus, resolution ,reflectivity and contamination.
适用:
  • Curved surface printing
  • Printing on highly reflective surfaces
  • MEMS
  • Bio Chips
  • Medical Devices
  • GaAs Application
  • Near-Field Sub-70 nm Printing
优势:
  • Low-cost
  • Reduces number of steppers/scanners required for fabrication
  • Reduces depth-of-focus and contamination control requirements in existing optical lithography technology
  • Works in conjunction with steppers/scanners improving quality of optical lithography
  • Simplified materials processing eliminating need for anti-reflective coatings
  • Can be used to improve resolution capabilities of optical lithography
  • Decouples lithography into two easier and cheaper steps
权利状况: Issued: 7,125,639 (USA)
项目联系方式:0755-86674700, 电子邮箱:ss@sotcbb.com

  • 我要咨询
  • 收藏
  • 打印
  • 分享:
用户登录
邮件地址/手机号
密码
验证码